Effects of growth parameters on surface-morphological, structural, electrical and optical properties of AZO Films by RF magnetron sputtering

Shou Yi Kuo*, Wei Ting Lin, Liann Be Chang, Ming Jer Jeng, Yong Tian Lu, Sung Cheng Hu

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

1 Scopus citations

Abstract

500 nm-thick aluminum-doped zinc oxide (ZnO.Al) thin film is usually used as a front transparent conductive oxide (TCO) contact on photovoltaic devices, and for this application is often deposited by a reactive radio-frequency (r.f.) magnetron sputtering system from a ceramic target. This work reports on the preparation and characterization of AZO thin films on Corning 1737 glass substrates grown by reactive r.f.-magnetron sputtering from a ZnO ceramic target with 2 wt% A1 content. It was found that the growth parameters, such as chamber pressure, working power, and deposition temperature, have significant influences on the properties of AZO films. According to the experimental results: (1) Films were polycrystalline showing a strong preferred c-axis orientation. (2) With increasing working power, the resistivity decreased, and mobility and the carrier concentration increased. (3) Lower deposition temperature leads to a decrease in resistivity, with 2.5 × 10-4 Ω-cm representing the lowest resistivity reached.

Original languageEnglish
Title of host publicationZinc Oxide and Related Materials - 2009
Pages141-146
Number of pages6
StatePublished - 2010
Event2009 MRS Fall Meeting - Boston, MA, United States
Duration: 30 11 200904 12 2009

Publication series

NameMaterials Research Society Symposium Proceedings
Volume1201
ISSN (Print)0272-9172

Conference

Conference2009 MRS Fall Meeting
Country/TerritoryUnited States
CityBoston, MA
Period30/11/0904/12/09

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