| Translated title of the contribution | 金屬間絕緣層及氮化矽間隔物對熱載子所引起金氧半場效電晶體退化之效應 |
|---|---|
| Original language | American English |
| Supervisors/Advisors |
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| State | Published - 1999 |
| Externally published | Yes |
Effects of IMD and Nitride Spacer on Hot Carrier Induced MOSFET Degradation
劉維理
Research output: Types of Thesis › Master's thesis