Effects of IMD and Nitride Spacer on Hot Carrier Induced MOSFET Degradation

劉維理

Research output: Types of ThesisMaster's thesis

Translated title of the contribution金屬間絕緣層及氮化矽間隔物對熱載子所引起金氧半場效電晶體退化之效應
Original languageAmerican English
Supervisors/Advisors
  • Lin, Jeng-Ping, Supervisor
StatePublished - 1999
Externally publishedYes

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