Effects of post-deposition annealing and oxygen content on the structural and pH-sensitive properties of thin Nd²O³ films

Material Science

• Annealing 100%
• Membrane 50%
• Silicon 50%
• Temperature 50%
• Density 50%
• Electrolyte 50%
• X-Ray Diffraction 50%
• Surface Roughness 50%
• Structural Property 50%
• Atomic Force Microscopy 50%
• Semiconductor Device 50%
• X-Ray Photoelectron Spectroscopy 50%
• Argon 50%
• Buffer Solution 50%