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Effects of thermal annealing on the luminescence and structural properties of high indium-content InGaN/GaN quantum wells

  • C. C. Chuo*
  • , C. M. Lee
  • , T. E. Nee
  • , J. I. Chyi
  • *Corresponding author for this work
  • National Central University

Research output: Contribution to journalJournal Article peer-review

58 Scopus citations

Abstract

Postgrowth thermal annealing was applied to investigate the optical and structural properties of InxGa1-xN/GaN multiple quantum wells with high InN mole fraction. Thermal annealing at 900°C results in a twentyfold increase of the integrated photoluminescence intensity. Photoluminescence emission is also improved from a broad band for the as-grown sample to two dominant peaks for the annealed sample. Cross-sectional transmission electron microscopy shows the existence of quantum dot-like islands in the wells for the as-grown sample but these islands are significantly reduced after thermal annealing at 900°C.

Original languageEnglish
Pages (from-to)3902-3904
Number of pages3
JournalApplied Physics Letters
Volume76
Issue number26
DOIs
StatePublished - 26 06 2000
Externally publishedYes

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