Abstract
Postgrowth thermal annealing was applied to investigate the optical and structural properties of InxGa1-xN/GaN multiple quantum wells with high InN mole fraction. Thermal annealing at 900°C results in a twentyfold increase of the integrated photoluminescence intensity. Photoluminescence emission is also improved from a broad band for the as-grown sample to two dominant peaks for the annealed sample. Cross-sectional transmission electron microscopy shows the existence of quantum dot-like islands in the wells for the as-grown sample but these islands are significantly reduced after thermal annealing at 900°C.
| Original language | English |
|---|---|
| Pages (from-to) | 3902-3904 |
| Number of pages | 3 |
| Journal | Applied Physics Letters |
| Volume | 76 |
| Issue number | 26 |
| DOIs | |
| State | Published - 26 06 2000 |
| Externally published | Yes |
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