Abstract
GaN p-i-n rectifiers with 4 μm thick i-layers show typical reverse breakdown voltages of 100-600 V. We have studied the temperature dependence of current-voltage characteristics in these diodes, along with hole diffusion lengths and the deep level defects present. Generally we find that i-layer background doping varies significantly (from <1014 cm-3 to 2-3 × 1016 cm-3), which influences the current conduction mechanism. The hole diffusion lengths were in the range 0.6-0.8 μm, while deep level concentrations were ∼1016 cm-3.
| Original language | English |
|---|---|
| Article number | 3 |
| Pages (from-to) | 147-155 |
| Number of pages | 9 |
| Journal | Journal of Electronic Materials |
| Volume | 30 |
| Issue number | 3 |
| DOIs | |
| State | Published - 03 2001 |
| Externally published | Yes |
Keywords
- C-V measurements
- DLTS
- Deep centers
- GaN
- I-V measurements
- P-i-n rectifiers
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