Abstract
We report on experimental studies of an Al0.15Ga 0.85N/GaN high-electron-mobility transistor structure grown on a p-type Si (111) substrate. This structure is compatible with complementary metal-oxide-semiconductor (CMOS) technology and, thus, has great potential device applications. The low-temperature magnetoresistivity shows a parabolic dependence on the applied perpendicular magnetic field. This effect is ascribed to electron-electron interaction (EEI) effects in a weakly-disordered two-dimensional system. Our experimental results agree with the EEI theory when the correction term in the ballistic region has been subtracted.
Original language | English |
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Pages (from-to) | 754-758 |
Number of pages | 5 |
Journal | Journal of the Korean Physical Society |
Volume | 50 |
Issue number | 3 |
DOIs | |
State | Published - 03 2007 |
Keywords
- CMOS
- GaN
- HEMT
- Si