Electron-electron interactions in a two-dimensional electron system in an Al0.15Ga0.85N/GaN heterostructure grown on p-type Si

Jian Zhe Huang, Kuang Yao Chen, Kui Ming Chen, Shiou Shian Han, Li Hung Lin*, Zhi Hao Sun, C. T. Liang, P. H. Chang, N. C. Chen, Chin An Chang

*Corresponding author for this work

Research output: Contribution to journalJournal Article peer-review

4 Scopus citations

Abstract

We report on experimental studies of an Al0.15Ga 0.85N/GaN high-electron-mobility transistor structure grown on a p-type Si (111) substrate. This structure is compatible with complementary metal-oxide-semiconductor (CMOS) technology and, thus, has great potential device applications. The low-temperature magnetoresistivity shows a parabolic dependence on the applied perpendicular magnetic field. This effect is ascribed to electron-electron interaction (EEI) effects in a weakly-disordered two-dimensional system. Our experimental results agree with the EEI theory when the correction term in the ballistic region has been subtracted.

Original languageEnglish
Pages (from-to)754-758
Number of pages5
JournalJournal of the Korean Physical Society
Volume50
Issue number3
DOIs
StatePublished - 03 2007

Keywords

  • CMOS
  • GaN
  • HEMT
  • Si

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