Electron transport properties in novel orthorhombically-strained silicon material explored by the Monte Carlo method

Xin Wang*, D. L. Kencke, K. C. Liu, A. F. Tasch, L. F. Register, S. K. Banerjee

*Corresponding author for this work

Research output: Contribution to conferenceConference Paperpeer-review

6 Scopus citations

Abstract

We report for the first time on the electron transport properties of simple orthorhombically-strained silicon studied by density-functional theory and Monte Carlo simulation. The six degenerate valleys near X points in bulk silicon break into three pairs with different energy minima due to the orthorhombic strain. The degeneracy lifting causes electron redistribution among these valleys at low and intermediate electric fields. Thus the drift velocity is enhanced under an electric field transverse to the long-axis of the lowest valleys. The simple orthorhombically-strained Si grown on a Si0.6Ge6.4 sidewall has a low-field mobility almost twice that of bulk Si and an electron saturation velocity approximately 20% higher.

Original languageEnglish
Pages70-73
Number of pages4
StatePublished - 2000
Externally publishedYes
EventInternational Conference on Simulation of Semiconductor Processes and Devices - Seattle, WA, USA
Duration: 06 09 200008 09 2000

Conference

ConferenceInternational Conference on Simulation of Semiconductor Processes and Devices
CitySeattle, WA, USA
Period06/09/0008/09/00

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