Abstract
We report for the first time on the electron transport properties of simple orthorhombically-strained silicon studied by density-functional theory and Monte Carlo simulation. The six degenerate valleys near X points in bulk silicon break into three pairs with different energy minima due to the orthorhombic strain. The degeneracy lifting causes electron redistribution among these valleys at low and intermediate electric fields. Thus the drift velocity is enhanced under an electric field transverse to the long-axis of the lowest valleys. The simple orthorhombically-strained Si grown on a Si0.6Ge6.4 sidewall has a low-field mobility almost twice that of bulk Si and an electron saturation velocity approximately 20% higher.
Original language | English |
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Pages | 70-73 |
Number of pages | 4 |
State | Published - 2000 |
Externally published | Yes |
Event | International Conference on Simulation of Semiconductor Processes and Devices - Seattle, WA, USA Duration: 06 09 2000 → 08 09 2000 |
Conference
Conference | International Conference on Simulation of Semiconductor Processes and Devices |
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City | Seattle, WA, USA |
Period | 06/09/00 → 08/09/00 |