| Translated title of the contribution | 256Mbit DRAM良好的電性特性應用碳離子植入汲極端 |
|---|---|
| Original language | American English |
| Supervisors/Advisors |
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| State | Published - 2005 |
| Externally published | Yes |
Excellnet Electrical Characterization of 256Mbit DRAM with Carbon-Implanted Drain
楊家誠
Research output: Types of Thesis › Master's thesis