@inproceedings{1d0e19c78b674a6e8e5f58987d0d04f9,
title = "Fabrication and simulation of antireflective nanostructures on c-Si solar cells",
abstract = "The enhanced photoelectric conversion is demonstrated in nanostructured photovoltaics using colloidal lithography and reactive-ion-etching (RIE) techniques. From the reflectance spectroscopy, trapezoid-cone arrays (TCAs) Si with SiNx passivation layer effectively suppress the reflection in the wavelength range from 400 nm to 1000 nm. The power conversion shows the TCAs Si solar cell with 120 nm thickness of SiNx passivation layer achieves 13.736%, which is 8.87% and 2.56% enhancement compared to the conventional KOH-textured photovoltaics and TCAs with 80-nm-thick SiNx, respectively. An optical simulation based on RCWA describes the optimized shape of nanostructure to further reduce reflectance for maximum light absorption.",
author = "Kao, {Ming Hsuan} and Chen, {Ting Gang} and Tsai, {Min An} and Chen, {Hsin Chu} and Lai, {Fang I.} and Kuo, {Shou Yi} and Yu, {Pi Chen} and Kuo, {Hao Chung}",
year = "2011",
language = "英语",
isbn = "9780977565771",
series = "Optics InfoBase Conference Papers",
pages = "1529--1531",
booktitle = "Conference on Lasers and Electro-Optics/Pacific Rim, CLEOPR 2011",
note = "Conference on Lasers and Electro-Optics/Pacific Rim, CLEOPR 2011 ; Conference date: 28-08-2011 Through 01-09-2011",
}