Fault detection and isolation for plasma etching using model-based approach

Mu Huo Cheng, Huan Shin L, Shin Yeu Lin, Chun Hung Liu, Wen Yo Lee, Chia Hung Tsai

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

1 Scopus citations

Abstract

A fault detection and isolation system using model-based approach for the chamber pressure of plasma etching is developed. The dynamics of chamber pressure is modeled as a linear multiple-input-single-output closed-loop system and the model parameters are extracted by the system identification technique. The obtained parameters are then converted to physically meaningful features for detecting and isolating faults. The fuzzy inference and Dempster-Shafer evidence combining techniques are employed to detect and isolate fault from the features. The system has been evaluated by the measured data that are collected via SECS-II from the employed Lam490 plasma etcher for processing practical products. The test results are satisfactory for a large amount of practical data and extensive computer simulations.

Original languageEnglish
Title of host publication2003 IEEEI/SEMI Advanced Semiconductor Manufacturing Conference and Workshop
Subtitle of host publicationAdvancing the Science of Semiconductor Manufacturing Excellence, ASMC 2003
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages208-214
Number of pages7
ISBN (Electronic)0780376730
DOIs
StatePublished - 2003
Externally publishedYes
Event14th Annual IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop, ASMC 2003 - Munich, Germany
Duration: 31 03 200301 04 2003

Publication series

NameASMC (Advanced Semiconductor Manufacturing Conference) Proceedings
Volume2003-January
ISSN (Print)1078-8743

Conference

Conference14th Annual IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop, ASMC 2003
Country/TerritoryGermany
CityMunich
Period31/03/0301/04/03

Bibliographical note

Publisher Copyright:
© 2003 IEEE.

Keywords

  • Computer vision
  • Data mining
  • Etching
  • Fault detection
  • Plasma applications
  • Plasma materials processing
  • Plasma measurements
  • Plasma simulation
  • System identification
  • Testing

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