| Translated title of the contribution | 使用氮化鈦(TiNx)界面覆蓋層與上金屬電極工程的鑭(La)/鋯(Zr)掺雜之氧化鉿(HfO2)之鐵電記憶體特性 |
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| Original language | American English |
| Supervisors/Advisors |
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| State | Published - 2024 |
| Externally published | Yes |
Ferroelectric memory characteristics of La/Zr-doped HfO2 film using TiNx interfacial capping layer and top metal electrode engineering
ASIM SENAPATI
Research output: Types of Thesis › Doctoral thesis