Ferroelectric memory characteristics of La/Zr-doped HfO2 film using TiNx interfacial capping layer and top metal electrode engineering

Research output: Types of Thesis › Doctoral thesis

Translated title of the contribution	使用氮化鈦(TiNx)界面覆蓋層與上金屬電極工程的鑭(La)/鋯(Zr)掺雜之氧化鉿(HfO2)之鐵電記憶體特性
Original language	American English
Supervisors/Advisors	Maikap, Siddheswar, Supervisor
State	Published - 2024
Externally published	Yes

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