Abstract
In this work, we reported the integration of 10-V CMOS logic circuit, 20-V gate driver, and 600-V VDMOSFET on a 4H-SiC single chip for full SiC smart power ICs. This integration process features PMOSFET isolation (P-iso) from the high voltage substrate, local oxidation of SiC isolation between devices, dual gate oxide thickness, and P+ poly-Si gate. It is demonstrated that the blocking capability of the P-iso structure can exceed 700 V and the switch of the VDMOSFET can be controlled by a 10-V signal through a 10-V to 20-V level shifter and a 20-V gate driver.
Original language | English |
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Title of host publication | 2022 34th International Symposium on Power Semiconductor Devices and ICs, ISPSD 2022 |
Publisher | Institute of Electrical and Electronics Engineers Inc. |
Pages | 321-324 |
Number of pages | 4 |
ISBN (Electronic) | 9781665422017 |
DOIs | |
State | Published - 2022 |
Externally published | Yes |
Event | 34th IEEE International Symposium on Power Semiconductor Devices and ICs, ISPSD 2022 - Vancouver, Canada Duration: 22 05 2022 → 25 05 2022 |
Publication series
Name | Proceedings of the International Symposium on Power Semiconductor Devices and ICs |
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Volume | 2022-May |
ISSN (Print) | 1063-6854 |
Conference
Conference | 34th IEEE International Symposium on Power Semiconductor Devices and ICs, ISPSD 2022 |
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Country/Territory | Canada |
City | Vancouver |
Period | 22/05/22 → 25/05/22 |
Bibliographical note
Publisher Copyright:© 2022 IEEE.
Keywords
- CMOS
- VDMOSFET
- gate driver
- isolation
- power IC
- silicon carbide
- single-chip integration