| Translated title of the contribution | 四氟化碳電漿前和後鈍化處理技術對於高效能和低待命功率氟化二氧化鉿n型/p型金氧半場效電晶體之應用 |
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| Original language | American English |
| Supervisors/Advisors |
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| State | Published - 2010 |
| Externally published | Yes |
Fluorinated CMOS HfO2 n-/p-MOSFETS by Pre- and Post-CF4 Plasma Passivation for High Performance (HP) and Low Stand-by Power (LSTP) Application
- 邱懷賢
Research output: Types of Thesis › Master's thesis