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Fluorinated HfO2 gate dielectrics engineering for CMOS by pre-and post-CF4 plasma passivation
Woei Cherng Wu, Chao Sung Lai*, Shih Ching Lee, Ma Ming-Wen, Tien Sheng Chao, Jer Chyi Wang, Chih Wei Hsu, Pai Chi Chou, Jian Hao Chen, Kuo Hsing Kao, Wen Cheng Lo, Tsung Yi Lu, Li Lin Tay, Nelson Rowell
*Corresponding author for this work
Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review
14
Scopus
citations