High-κ Hf-based charge trapping layer with Al2O 3 blocking oxide for high-density flash memory

S. Maikap*, P. J. Tzeng, L. S. Lee, H. Y. Lee, C. C. Wang, P. H. Tsai, K. S. Chang-Liao, W. J. Chen, K. C. Liu, P. R. Jeng, M. J. Tsai

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

6 Scopus citations

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