TY - JOUR
T1 - High-efficiency InGaN-based yellow-green light-emitting diodes
AU - Lai, Mu Jen
AU - Jeng, Ming Jer
AU - Chang, Liann Be
PY - 2010/2
Y1 - 2010/2
N2 - We demonstrate the characteristics of high-efficiency yellow-green InGaN-based light-emitting diodes (LEDs) with a strain-accommodative layer and textured surface. The LEDs have chip dimensions of 420 × 350 μm 2 and are packaged in the conventional lamp form. The peak wavelength, optical output power, luminaire efficiency, and external quantum efficiency are 560.7 nm, 0.926 mW, 7.8lm/W, and 2.1%, respectively, at a driving current of 20 mA. In addition, the output power slope (mW/mA) is 3.3 × 10-2. It is found that there is potential to improve external quantum efficiency by introducing a chirp InGaN/GaN superlattice structure as the strain-accommodative layer and texturing the surface of the top P-layer in yellow-green InGaN/GaN LEDs. The low power slope can be attributed chiefly to the inferior crystalline quality due to unfavorable growth conditions of InGaN/GaN multiple quantum wells and partially to the stronger internal electric field due to the higher In composition in InGaN wells.
AB - We demonstrate the characteristics of high-efficiency yellow-green InGaN-based light-emitting diodes (LEDs) with a strain-accommodative layer and textured surface. The LEDs have chip dimensions of 420 × 350 μm 2 and are packaged in the conventional lamp form. The peak wavelength, optical output power, luminaire efficiency, and external quantum efficiency are 560.7 nm, 0.926 mW, 7.8lm/W, and 2.1%, respectively, at a driving current of 20 mA. In addition, the output power slope (mW/mA) is 3.3 × 10-2. It is found that there is potential to improve external quantum efficiency by introducing a chirp InGaN/GaN superlattice structure as the strain-accommodative layer and texturing the surface of the top P-layer in yellow-green InGaN/GaN LEDs. The low power slope can be attributed chiefly to the inferior crystalline quality due to unfavorable growth conditions of InGaN/GaN multiple quantum wells and partially to the stronger internal electric field due to the higher In composition in InGaN wells.
UR - https://www.scopus.com/pages/publications/77950850820
U2 - 10.1143/JJAP.49.021004
DO - 10.1143/JJAP.49.021004
M3 - 文章
AN - SCOPUS:77950850820
SN - 0021-4922
VL - 49
JO - Japanese Journal of Applied Physics
JF - Japanese Journal of Applied Physics
IS - 2 Part 1
M1 - 021004
ER -