High power density and large voltage swing of enhancement-mode Al0.5Ga0.5As/InGaAs pseudomorphic high electron mobility transistor for 3.5 V L-band applications

Hsien Chin Chiu*, Shih Cheng Yang, Yi Jen Chan

*Corresponding author for this work

Research output: Contribution to journalJournal Article peer-review

Abstract

A high power density and a large voltage swing of Al0.5Ga0.5As/InGaAs enhancement-mode pseudomorphic high electron mobility transistor (pHEMTs) operated under Vds = 3.5 V for L-band application have been achieved using a high-uniformity and high-selectivity BCl3+CHF3 gas mixture. In this study, we improve the current density and the gate voltage operation region of the device by increasing the Al mole fraction of AlxGa1-xAs to x = 0.5. The developed 1.0-μm-long and 1 mm-wide gate FETs exhibit Vth = +0.24 V and Imax of 286 mA/mm. The maximum output power under a 1.9 GHz operation is 95 mW/ mm, with a linear power gain of 18.7 dB, and a power-added efficiency of 60%. These characteristics demonstrate that E-pHEMTs have great potential for using in microwave power device applications.

Original languageEnglish
Pages (from-to)2902-2903
Number of pages2
JournalJapanese Journal of Applied Physics
Volume41
Issue number5 A
DOIs
StatePublished - 05 2002
Externally publishedYes

Keywords

  • Enhancement-mode pHEMTs
  • High efficiency and power
  • Reactive ion etching

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