Abstract
A high power density and a large voltage swing of Al0.5Ga0.5As/InGaAs enhancement-mode pseudomorphic high electron mobility transistor (pHEMTs) operated under Vds = 3.5 V for L-band application have been achieved using a high-uniformity and high-selectivity BCl3+CHF3 gas mixture. In this study, we improve the current density and the gate voltage operation region of the device by increasing the Al mole fraction of AlxGa1-xAs to x = 0.5. The developed 1.0-μm-long and 1 mm-wide gate FETs exhibit Vth = +0.24 V and Imax of 286 mA/mm. The maximum output power under a 1.9 GHz operation is 95 mW/ mm, with a linear power gain of 18.7 dB, and a power-added efficiency of 60%. These characteristics demonstrate that E-pHEMTs have great potential for using in microwave power device applications.
Original language | English |
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Pages (from-to) | 2902-2903 |
Number of pages | 2 |
Journal | Japanese Journal of Applied Physics |
Volume | 41 |
Issue number | 5 A |
DOIs | |
State | Published - 05 2002 |
Externally published | Yes |
Keywords
- Enhancement-mode pHEMTs
- High efficiency and power
- Reactive ion etching