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High quality ultra-thin (2.4nm) oxide prepared by clustered vertical furnace with in-situ HF-vapor pre-gate oxide cleaning
T. S. Chao*, J. L. Chen, C. S. Lai, H. C. Lin, T. Y. Huang
*Corresponding author for this work
Research output: Contribution to journal › Conference article › peer-review
1
Scopus
citations