Immobilization of enzyme and antibody on ALD-HfO 2-EIS structure by NH 3 plasma treatment

I. Shun Wang; Yi Ting Lin; Chi Hsien Huang; Tseng Fu Lu; Cheng En Lue; Polung Yang; Dorota G. Pijanswska; Chia Ming Yang; Jer Chyi Wang; Jau Song Yu; Yu Sun Chang; Chou Chien; Chao Sung Lai

doi:10.1186/1556-276X-7-179

Immobilization of enzyme and antibody on ALD-HfO ₂-EIS structure by NH ₃ plasma treatment

I. Shun Wang, Yi Ting Lin, Chi Hsien Huang, Tseng Fu Lu, Cheng En Lue, Polung Yang, Dorota G. Pijanswska, Chia Ming Yang, Jer Chyi Wang, Jau Song Yu, Yu Sun Chang, Chou Chien, Chao Sung Lai^*

^*Corresponding author for this work

Research output: Contribution to journal › Journal Article › peer-review

12 Scopus citations

Abstract

Thin hafnium oxide layers deposited by an atomic layer deposition system were investigated as the sensing membrane of the electrolyte-insulator-semiconductor structure. Moreover, a post-remote NH ₃ plasma treatment was proposed to replace the complicated silanization procedure for enzyme immobilization. Compared to conventional methods using chemical procedures, remote NH ₃ plasma treatment reduces the processing steps and time. The results exhibited that urea and antigen can be successfully detected, which indicated that the immobilization process is correct.

Original language	English
Journal	Nanoscale Research Letters
Volume	7
DOIs	https://doi.org/10.1186/1556-276X-7-179
State	Published - 2012

Keywords

Remote plasma
Silanization procedure
Surface functionalization

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10.1186/1556-276X-7-179

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@article{c162792be6e040a6b88eb0819708f25c,

title = "Immobilization of enzyme and antibody on ALD-HfO 2-EIS structure by NH 3 plasma treatment",

abstract = "Thin hafnium oxide layers deposited by an atomic layer deposition system were investigated as the sensing membrane of the electrolyte-insulator-semiconductor structure. Moreover, a post-remote NH 3 plasma treatment was proposed to replace the complicated silanization procedure for enzyme immobilization. Compared to conventional methods using chemical procedures, remote NH 3 plasma treatment reduces the processing steps and time. The results exhibited that urea and antigen can be successfully detected, which indicated that the immobilization process is correct.",

keywords = "Remote plasma, Silanization procedure, Surface functionalization",

author = "Wang, {I. Shun} and Lin, {Yi Ting} and Huang, {Chi Hsien} and Lu, {Tseng Fu} and Lue, {Cheng En} and Polung Yang and Pijanswska, {Dorota G.} and Yang, {Chia Ming} and Wang, {Jer Chyi} and Yu, {Jau Song} and Chang, {Yu Sun} and Chou Chien and Lai, {Chao Sung}",

year = "2012",

doi = "10.1186/1556-276X-7-179",

language = "英语",

volume = "7",

journal = "Nanoscale Research Letters",

issn = "1931-7573",

publisher = "Springer New York",

}

TY - JOUR

T1 - Immobilization of enzyme and antibody on ALD-HfO 2-EIS structure by NH 3 plasma treatment

AU - Wang, I. Shun

AU - Lin, Yi Ting

AU - Huang, Chi Hsien

AU - Lu, Tseng Fu

AU - Lue, Cheng En

AU - Yang, Polung

AU - Pijanswska, Dorota G.

AU - Yang, Chia Ming

AU - Wang, Jer Chyi

AU - Yu, Jau Song

AU - Chang, Yu Sun

AU - Chien, Chou

AU - Lai, Chao Sung

PY - 2012

Y1 - 2012

N2 - Thin hafnium oxide layers deposited by an atomic layer deposition system were investigated as the sensing membrane of the electrolyte-insulator-semiconductor structure. Moreover, a post-remote NH 3 plasma treatment was proposed to replace the complicated silanization procedure for enzyme immobilization. Compared to conventional methods using chemical procedures, remote NH 3 plasma treatment reduces the processing steps and time. The results exhibited that urea and antigen can be successfully detected, which indicated that the immobilization process is correct.

AB - Thin hafnium oxide layers deposited by an atomic layer deposition system were investigated as the sensing membrane of the electrolyte-insulator-semiconductor structure. Moreover, a post-remote NH 3 plasma treatment was proposed to replace the complicated silanization procedure for enzyme immobilization. Compared to conventional methods using chemical procedures, remote NH 3 plasma treatment reduces the processing steps and time. The results exhibited that urea and antigen can be successfully detected, which indicated that the immobilization process is correct.

KW - Remote plasma

KW - Silanization procedure

KW - Surface functionalization

UR - http://www.scopus.com/inward/record.url?scp=84859409940&partnerID=8YFLogxK

U2 - 10.1186/1556-276X-7-179

DO - 10.1186/1556-276X-7-179

M3 - 文章

AN - SCOPUS:84859409940

SN - 1931-7573

VL - 7

JO - Nanoscale Research Letters

JF - Nanoscale Research Letters

ER -

Immobilization of enzyme and antibody on ALD-HfO ₂-EIS structure by NH ₃ plasma treatment

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Keywords

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