Impact of AlOx interfacial layer and switching mechanism in W/AlOx/TaOx/TiN RRAMs

  • Somsubhra Chakrabarti
  • , Debanjan Jana
  • , Mrinmoy Dutta
  • , Siddheswar Maikap
  • , Yi Yan Chen
  • , Jer Ren Yang

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

2 Scopus citations

Abstract

Effects of AlOx interfacial layer in the W/AlO x/TaOx/TiN structures have been investigated for the first time. This RRAM device shows long endurance of 106 cycles and good retention at 85°C for a low current compliance of 100 μA. A physics based simulation is studied to understand the set and reset mechanism of RRAM. The nature of ions migration, potential profile and temperature of filament during switching is explained using numerical simulation done by MATLAB.

Original languageEnglish
Title of host publication2014 IEEE 6th International Memory Workshop, IMW 2014
PublisherIEEE Computer Society
ISBN (Print)9781479935949
DOIs
StatePublished - 2014
Event2014 IEEE 6th International Memory Workshop, IMW 2014 - Taipei, Taiwan
Duration: 18 05 201421 05 2014

Publication series

Name2014 IEEE 6th International Memory Workshop, IMW 2014

Conference

Conference2014 IEEE 6th International Memory Workshop, IMW 2014
Country/TerritoryTaiwan
CityTaipei
Period18/05/1421/05/14

Keywords

  • AlOx
  • MATLAB simulation
  • RRAM interfacial layer
  • TaOx
  • switching mechanism

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