TY - JOUR
T1 - Improvement of electrostatic discharge protection by introducing a spindt-type silicon field emission device
AU - Chang, Liann Be
AU - Ferng, Yi Cherng
AU - Liao, Jhong Wei
AU - Lin, Ching Chi
PY - 2012/4
Y1 - 2012/4
N2 - In this paper, an original Spindt-type silicon field emission device (FED) with electrostatic discharge (ESD) regulation capability is proposed. The fabricated FED characteristics, including process parameters, capacitance-voltage (C-V), current-voltage (I-V), and frequency response, are investigated. To verify its capability of ESD protection, we replace the metal oxide varistor (MOV) in a state-of-the-art protection configuration with the fabricated FED under the application conditions of system-level ESD tests. The measured results show that the proposed ESD protection circuit composed of a prestage gas arrestor, an intermediate resistor, and an introduced FED can suppress an injected ESD pulse voltage of 6000 to 3193 V, a reduction of 46.8%, whereas suppression is to 5606 V, a reduction of 6.57%, when using only a gas arrestor.
AB - In this paper, an original Spindt-type silicon field emission device (FED) with electrostatic discharge (ESD) regulation capability is proposed. The fabricated FED characteristics, including process parameters, capacitance-voltage (C-V), current-voltage (I-V), and frequency response, are investigated. To verify its capability of ESD protection, we replace the metal oxide varistor (MOV) in a state-of-the-art protection configuration with the fabricated FED under the application conditions of system-level ESD tests. The measured results show that the proposed ESD protection circuit composed of a prestage gas arrestor, an intermediate resistor, and an introduced FED can suppress an injected ESD pulse voltage of 6000 to 3193 V, a reduction of 46.8%, whereas suppression is to 5606 V, a reduction of 6.57%, when using only a gas arrestor.
UR - https://www.scopus.com/pages/publications/84860475661
U2 - 10.1143/JJAP.51.044103
DO - 10.1143/JJAP.51.044103
M3 - 文章
AN - SCOPUS:84860475661
SN - 0021-4922
VL - 51
JO - Japanese Journal of Applied Physics
JF - Japanese Journal of Applied Physics
IS - 4 PART 1
M1 - 044103
ER -