Impurities in ion plated chromium films

J. H. Hsieh*, R. F. Hochman

*Corresponding author for this work

Research output: Contribution to journalJournal Article peer-review

3 Scopus citations


Oxygen, carbon and argon concentrations in chromium films produced by triode ion plating were studied as a function of substrate bias and cathode current density (or ion flux). The results reveal the following. (1) Ion plating with low bias and high ion flux can produce films with low oxygen and carbon concentrations. (2) At high bias, the effect of energetic particle bombardment on decreasing oxygen and carbon concentrations is not as effective as in low bias ion plating. (3) The amount of argon entrapped in the films increases with the increase in bias voltage and bombarding particle flux. A qualitative model based on the theory of energetic particle bombardment is used to explain the results.

Original languageEnglish
Pages (from-to)315-319
Number of pages5
JournalSurface and Coatings Technology
StatePublished - 1992
Externally publishedYes


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