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Influence of postdeposition annealing on physical and electrical properties of high-k Yb2TiO5 gate dielectrics

  • Tung Ming Pan*
  • , Li Chen Yen
  • , Chien Hung Chiang
  • , Tien Sheng Chao
    • *Corresponding author for this work
  • National Yang Ming Chiao Tung University
  • Chang Gung University

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

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