Influence of postdeposition annealing on physical and electrical properties of high-k Yb₂TiO₅ gate dielectrics

Tung Ming Pan^*, Li Chen Yen, Chien Hung Chiang, Tien Sheng Chao

^*Corresponding author for this work

Department of Electronic Engineering

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

Biochemistry, Genetics and Molecular Biology

Material Science