Influence of RF magnetron sputtering conditions on the properties of transparent conductive gallium-doped magnesium zinc oxide thin films

Hsin Chun Lu; Jia Chiuan Jou; Chun Lung Chu

doi:10.1016/j.surfcoat.2012.10.029

Influence of RF magnetron sputtering conditions on the properties of transparent conductive gallium-doped magnesium zinc oxide thin films

Hsin Chun Lu^*
, Jia Chiuan Jou
, Chun Lung Chu

^*Corresponding author for this work

Department of Chemical and Materials Engineering

Chang Gung University

Research output: Contribution to journal › Journal Article › peer-review

20 Scopus citations

Abstract

Gallium-doped magnesium zinc oxide (GMZO) thin films were deposited onto glass substrates using RF magnetron sputtering using GMZO ceramic targets under different sputtering conditions. The substrate temperature and deposition pressure effects on the structural, electrical and optical properties of the GMZO thin film were investigated. Transparent conductive GMZO thin films were demonstrated in this study to possess a wurtzite structure, average transmittance above 80% in the 400nm and 800nm wavelength range with a low resistivity of 1.62×10^-3Ωcm when deposited onto glass substrates using RF magnetron sputtering.

Original language	English
Pages (from-to)	539-542
Number of pages	4
Journal	Surface and Coatings Technology
Volume	231
DOIs	https://doi.org/10.1016/j.surfcoat.2012.10.029
State	Published - 25 09 2013

Keywords

Electrical and optical properties
Gallium-doped magnesium zinc oxide
RF magnetron sputtering
Thin films

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10.1016/j.surfcoat.2012.10.029

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title = "Influence of RF magnetron sputtering conditions on the properties of transparent conductive gallium-doped magnesium zinc oxide thin films",

abstract = "Gallium-doped magnesium zinc oxide (GMZO) thin films were deposited onto glass substrates using RF magnetron sputtering using GMZO ceramic targets under different sputtering conditions. The substrate temperature and deposition pressure effects on the structural, electrical and optical properties of the GMZO thin film were investigated. Transparent conductive GMZO thin films were demonstrated in this study to possess a wurtzite structure, average transmittance above 80\% in the 400nm and 800nm wavelength range with a low resistivity of 1.62×10-3Ωcm when deposited onto glass substrates using RF magnetron sputtering.",

keywords = "Electrical and optical properties, Gallium-doped magnesium zinc oxide, RF magnetron sputtering, Thin films",

author = "Lu, \{Hsin Chun\} and Jou, \{Jia Chiuan\} and Chu, \{Chun Lung\}",

year = "2013",

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day = "25",

doi = "10.1016/j.surfcoat.2012.10.029",

language = "英语",

volume = "231",

pages = "539--542",

journal = "Surface and Coatings Technology",

issn = "0257-8972",

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TY - JOUR

T1 - Influence of RF magnetron sputtering conditions on the properties of transparent conductive gallium-doped magnesium zinc oxide thin films

AU - Lu, Hsin Chun

AU - Jou, Jia Chiuan

AU - Chu, Chun Lung

PY - 2013/9/25

Y1 - 2013/9/25

N2 - Gallium-doped magnesium zinc oxide (GMZO) thin films were deposited onto glass substrates using RF magnetron sputtering using GMZO ceramic targets under different sputtering conditions. The substrate temperature and deposition pressure effects on the structural, electrical and optical properties of the GMZO thin film were investigated. Transparent conductive GMZO thin films were demonstrated in this study to possess a wurtzite structure, average transmittance above 80% in the 400nm and 800nm wavelength range with a low resistivity of 1.62×10-3Ωcm when deposited onto glass substrates using RF magnetron sputtering.

AB - Gallium-doped magnesium zinc oxide (GMZO) thin films were deposited onto glass substrates using RF magnetron sputtering using GMZO ceramic targets under different sputtering conditions. The substrate temperature and deposition pressure effects on the structural, electrical and optical properties of the GMZO thin film were investigated. Transparent conductive GMZO thin films were demonstrated in this study to possess a wurtzite structure, average transmittance above 80% in the 400nm and 800nm wavelength range with a low resistivity of 1.62×10-3Ωcm when deposited onto glass substrates using RF magnetron sputtering.

KW - Electrical and optical properties

KW - Gallium-doped magnesium zinc oxide

KW - RF magnetron sputtering

KW - Thin films

UR - https://www.scopus.com/pages/publications/84882814661

U2 - 10.1016/j.surfcoat.2012.10.029

DO - 10.1016/j.surfcoat.2012.10.029

M3 - 文章

AN - SCOPUS:84882814661

SN - 0257-8972

VL - 231

SP - 539

EP - 542

JO - Surface and Coatings Technology

JF - Surface and Coatings Technology

ER -

Influence of RF magnetron sputtering conditions on the properties of transparent conductive gallium-doped magnesium zinc oxide thin films

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Keywords

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