Influence of Y Doping on WO3 Membranes Applied in Electrolyte-Insulator-Semiconductor Structures

Chyuan Haur Kao, Yu Ching Liao, Chi Chih Chuang, Yi Hsuan Huang, Chang Hsueh Lee, Shih Ming Chen, Ming Ling Lee*, Hsiang Chen*

*Corresponding author for this work

Research output: Contribution to journalJournal Article peer-review

1 Scopus citations

Abstract

In this paper, tungsten oxide (WO3) is deposited on a silicon substrate applied in electrolyte-insulator-semiconductor structures for pH sensing devices. To boost the sensing performance, yttrium (Y) is doped into WO3 membranes, and annealing is incorporated in the fabrication process. To investigate the effects of Y doping and annealing, multiple material characterizations including X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), atom force microscopy (AFM), scanning electron microscopy (SEM), and transmission electron microscopy (TEM) are performed. Material analysis results indicate that annealing and Y doping can increase crystallinity, suppress defects, and enhance grainization, thereby strengthening membrane sensing capabilities in terms of sensitivity, linearity, and reliability. Because of their stable response, high reliability, and compact size, Y-doped WO3 membranes are promising for future biomedical applications.

Original languageEnglish
Article number328
JournalMembranes
Volume12
Issue number3
DOIs
StatePublished - 03 2022

Bibliographical note

Publisher Copyright:
© 2022 by the authors. Licensee MDPI, Basel, Switzerland.

Keywords

  • annealing
  • defects
  • electrolyte-insulator-semiconductor
  • membranes
  • tungsten trioxide
  • yttrium doping

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