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InGaN p-i-n ultraviolet-A band-pass photodetectors

  • T. K. Ko*
  • , S. C. Shei
  • , S. J. Chang
  • , Y. Z. Chiou
  • , R. M. Lin
  • , W. S. Chen
  • , C. F. Shen
  • , C. S. Chang
  • , K. W. Lin
  • *Corresponding author for this work
  • National Cheng Kung University
  • Epitech Technology Corporation
  • Southern Taiwan University of Science and Technology

Research output: Contribution to journalJournal Article peer-review

5 Scopus citations

Abstract

InGaN p-i-n ultraviolet (UV)-A band-pass photodetectors (PDs) with indium-tin-oxide (ITO) contact and with flip-chip (FC) technology were both fabricated and characterised. With -5V applied bias, it was found that measured dark currents were 7×10-10 and 4×10-10 A for FC p-i-n PDs with i-In0.1Ga0.9N and i-In 0.05Ga0.95N active layers, respectively. With an incident light wavelength of 385nm, it was found that external quantum efficiencies of FC p-i-n PD and ITO p-i-n PD were around 67 and 35, respectively. The rejection ratios of FC p-i-n PD were also found to be larger than those observed from ITO p-i-n PD.

Original languageEnglish
Pages (from-to)212-214
Number of pages3
JournalIEE Proceedings: Optoelectronics
Volume153
Issue number4
DOIs
StatePublished - 08 2006

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