Introduction

Cher Ming Tan*, Feifei He

*Corresponding author for this work

Research output: Contribution to journalJournal Editorial

Abstract

With the continuous increasing circuit complexity and the down-scaling of the minimum feature size in integrated circuits (ICs), the electromigration (EM) reliability of ICs is becoming increasingly important. As re-design and re-manufacture are very time- and resource-consuming for present-day, ultra large-scale integration (ULSI), “Design-for-Reliability,” is essential.

Original languageEnglish
Pages (from-to)1-6
Number of pages6
JournalSpringerBriefs in Applied Sciences and Technology
Issue number9789814451208
DOIs
StatePublished - 2013
Externally publishedYes

Bibliographical note

Publisher Copyright:
© 2013, The Author(s).

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