Abstract
The aspect ratio (AR) of shallow isolation trench (STI) structures will increase as device feature size continues to shrink. Complicated HDP CVD processes or alternative gap-fill approaches, which lead to severe overfill topographies, will be proposed. However, those kinds of topographies will make great impacts on the STI CMP process, endpoint detection (EPD) especially. The EPD process control is crucial to manufacturability. In this paper, the characteristic of the motor-current EPD system, monitoring a direct STI CMP process with acid ceria-based slurry, has been studied on various STI gap-fill schemes. The EPD signals are sensitive to topographies, and show quadratic relationship between the processing time and overfill features.
Original language | English |
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Pages | 119-122 |
Number of pages | 4 |
State | Published - 2006 |
Externally published | Yes |
Event | 11th International Chemical-Mechanical Planarization for ULSI Multilevel Interconnection Conference, CMP-MIC 2006 - Fremont, CA, United States Duration: 21 02 2006 → 23 02 2006 |
Conference
Conference | 11th International Chemical-Mechanical Planarization for ULSI Multilevel Interconnection Conference, CMP-MIC 2006 |
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Country/Territory | United States |
City | Fremont, CA |
Period | 21/02/06 → 23/02/06 |