Investigation on the abnormal resistive switching induced by ultraviolet light exposure based on HfOx film

Physics

• Light 100%
• Resistive Switching 100%
• Variations 50%
• Simulation 50%
• Differences 50%
• Shapes 50%
• Electric Potential 50%
• Networks 50%
• Electrical Properties 50%
• Ultraviolet Laser 50%

Engineering

• Characteristics 100%
• Ultraviolet Light 100%
• Resistive 100%
• Switching 100%
• Properties 33%
• Defects 33%
• Simulation 33%
• Forming 33%
• Networks (Circuits) 33%
• Voltage Fluctuation 33%

Material Science

• Film 100%
• Electrical Property 66%
• Indium Tin Oxide 66%
• Devices 33%
• Current-Voltage Characteristic 33%
• Electronic Circuit 33%
• Laser 33%
• Forming Process 33%