LCVD製程條件對以W(CO)6鍍製之鎢薄膜性質影響之探討

Translated title of the contribution: Effect of LCVD Process Parameters on the Properties of Tungsten Thin Films Using Tungsten Hexacarbonyl Precursor

刁俊民

Research output: Types of Thesis › Master's thesis

Translated title of the contributionEffect of LCVD Process Parameters on the Properties of Tungsten Thin Films Using Tungsten Hexacarbonyl Precursor
Original languageChinese (Traditional)
Supervisors/Advisors
  • Lu, Hsin-Chun, Supervisor
StatePublished - 2009
Externally publishedYes

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