Low cost and flexible electrodes with NH3 plasma treatments in extended gate field effect transistors for urea detection

Chia Ming Yang; I. Shun Wang; Yi Ting Lin; Chi Hsien Huang; Tseng Fu Lu; Cheng En Lue; Dorota G. Pijanowska; Mu Yi Hua; Chao Sung Lai

doi:10.1016/j.snb.2012.11.023

Low cost and flexible electrodes with NH3 plasma treatments in extended gate field effect transistors for urea detection

Chia Ming Yang, I. Shun Wang, Yi Ting Lin, Chi Hsien Huang, Tseng Fu Lu, Cheng En Lue, Dorota G. Pijanowska, Mu Yi Hua, Chao Sung Lai^*

^*Corresponding author for this work

Research output: Contribution to journal › Journal Article › peer-review

28 Scopus citations

Abstract

In this study, the ammoniated indium tin oxide (ITO) films prepared by different condition of NH3 plasma treatment on flexible polyethylene terephthalate substrates are proposed as sensing electrodes of extended-gate field-effect transistors (EGFETs). pH sensitivity calculated from the output voltage in buffer solution from pH 2.1 to pH 12.1 in the samples with NH3 plasma treatment for 6min is slightly increased about 2.8mV/pH. For urea sensing performance comparison, longer time in the plasma treatment of ITO/PET-EGFET has higher sensitivity in urea detection, which could be explained by more amine groups for more urease binding on ITO surface. Low-cost substrate and high-reproducibility surface modification of NH3 plasma treatment are suggested to investigate the lifetime and stability for future urea sensor application. Crown

Original language	English
Pages (from-to)	274-279
Number of pages	6
Journal	Sensors and Actuators, B: Chemical
Volume	187
DOIs	https://doi.org/10.1016/j.snb.2012.11.023
State	Published - 2013

Keywords

EGFET
Flexible substrate
NH3 plasma
Urea

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10.1016/j.snb.2012.11.023

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title = "Low cost and flexible electrodes with NH3 plasma treatments in extended gate field effect transistors for urea detection",

abstract = "In this study, the ammoniated indium tin oxide (ITO) films prepared by different condition of NH3 plasma treatment on flexible polyethylene terephthalate substrates are proposed as sensing electrodes of extended-gate field-effect transistors (EGFETs). pH sensitivity calculated from the output voltage in buffer solution from pH 2.1 to pH 12.1 in the samples with NH3 plasma treatment for 6min is slightly increased about 2.8mV/pH. For urea sensing performance comparison, longer time in the plasma treatment of ITO/PET-EGFET has higher sensitivity in urea detection, which could be explained by more amine groups for more urease binding on ITO surface. Low-cost substrate and high-reproducibility surface modification of NH3 plasma treatment are suggested to investigate the lifetime and stability for future urea sensor application. Crown",

keywords = "EGFET, Flexible substrate, NH3 plasma, Urea",

author = "Yang, {Chia Ming} and Wang, {I. Shun} and Lin, {Yi Ting} and Huang, {Chi Hsien} and Lu, {Tseng Fu} and Lue, {Cheng En} and Pijanowska, {Dorota G.} and Hua, {Mu Yi} and Lai, {Chao Sung}",

year = "2013",

doi = "10.1016/j.snb.2012.11.023",

language = "英语",

volume = "187",

pages = "274--279",

journal = "Sensors and Actuators, B: Chemical",

issn = "0925-4005",

publisher = "Elsevier B.V.",

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TY - JOUR

T1 - Low cost and flexible electrodes with NH3 plasma treatments in extended gate field effect transistors for urea detection

AU - Yang, Chia Ming

AU - Wang, I. Shun

AU - Lin, Yi Ting

AU - Huang, Chi Hsien

AU - Lu, Tseng Fu

AU - Lue, Cheng En

AU - Pijanowska, Dorota G.

AU - Hua, Mu Yi

AU - Lai, Chao Sung

PY - 2013

Y1 - 2013

N2 - In this study, the ammoniated indium tin oxide (ITO) films prepared by different condition of NH3 plasma treatment on flexible polyethylene terephthalate substrates are proposed as sensing electrodes of extended-gate field-effect transistors (EGFETs). pH sensitivity calculated from the output voltage in buffer solution from pH 2.1 to pH 12.1 in the samples with NH3 plasma treatment for 6min is slightly increased about 2.8mV/pH. For urea sensing performance comparison, longer time in the plasma treatment of ITO/PET-EGFET has higher sensitivity in urea detection, which could be explained by more amine groups for more urease binding on ITO surface. Low-cost substrate and high-reproducibility surface modification of NH3 plasma treatment are suggested to investigate the lifetime and stability for future urea sensor application. Crown

AB - In this study, the ammoniated indium tin oxide (ITO) films prepared by different condition of NH3 plasma treatment on flexible polyethylene terephthalate substrates are proposed as sensing electrodes of extended-gate field-effect transistors (EGFETs). pH sensitivity calculated from the output voltage in buffer solution from pH 2.1 to pH 12.1 in the samples with NH3 plasma treatment for 6min is slightly increased about 2.8mV/pH. For urea sensing performance comparison, longer time in the plasma treatment of ITO/PET-EGFET has higher sensitivity in urea detection, which could be explained by more amine groups for more urease binding on ITO surface. Low-cost substrate and high-reproducibility surface modification of NH3 plasma treatment are suggested to investigate the lifetime and stability for future urea sensor application. Crown

KW - EGFET

KW - Flexible substrate

KW - NH3 plasma

KW - Urea

UR - http://www.scopus.com/inward/record.url?scp=84885485498&partnerID=8YFLogxK

U2 - 10.1016/j.snb.2012.11.023

DO - 10.1016/j.snb.2012.11.023

M3 - 文章

AN - SCOPUS:84885485498

SN - 0925-4005

VL - 187

SP - 274

EP - 279

JO - Sensors and Actuators, B: Chemical

JF - Sensors and Actuators, B: Chemical

ER -

Low cost and flexible electrodes with NH3 plasma treatments in extended gate field effect transistors for urea detection

Abstract

Keywords

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