Low polarization loss of long endurance on scavenged Ru-based electrode ferroelectric Hf0.5Zr0.5O2 by optimizing TiNx interfacial capping layer and its fatigue mechanism

Siddheswar Maikap, Y.-P. Chen, S.-Y. Huang, J.-Y. Lee, M.-H. Lee, C. W. Liu, Z.-F. Lou, Senapati

Research output: Contribution to journalJournal Article peer-review

Original languageAmerican English
Pages (from-to)673 - 676
JournalIEEE Electron Device Letters
Volume45
Issue number4
StatePublished - 04 2024

Bibliographical note

公開公告號: IEEE Electron Device Letters
Announcement ID: IEEE Electron Device Letters

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