Low-temperature water gas shift reaction on Cu/SiO2 prepared by an atomic layer epitaxy technique (Chemical Communications (2008) (4983-4985) DOI: 10.1039/b807428c)

Ching Shiun Chen, Jarrn Horng Lin, Tzu Wen Lai

Research output: Contribution to journalComment/debate

2 Scopus citations
Original languageEnglish
Pages (from-to)6613
Number of pages1
JournalChemical Communications
Issue number48
StatePublished - 2008

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