Original language | English |
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Pages (from-to) | 6613 |
Number of pages | 1 |
Journal | Chemical Communications |
Issue number | 48 |
State | Published - 2008 |
Low-temperature water gas shift reaction on Cu/SiO2 prepared by an atomic layer epitaxy technique (Chemical Communications (2008) (4983-4985) DOI: 10.1039/b807428c)
Ching Shiun Chen, Jarrn Horng Lin, Tzu Wen Lai
Research output: Contribution to journal › Comment/debate
2
Scopus
citations