TY - JOUR
T1 - Magnetic-field tunable multichannel filter in a plasma photonic crystal at microwave frequencies
AU - Chang, Tsung Wen
AU - Chien, Jia Ren Chang
AU - Wu, Chien Jang
N1 - Publisher Copyright:
© 2016 Optical Society of America.
PY - 2016/2/1
Y1 - 2016/2/1
N2 - The microwave magnetic-field tunable filtering properties in a multichannel filter based on use of a one-dimensional finite magnetized plasma photonic crystal (PPC) are theoretically investigated. The considered PPC has a structure of air/(AB)N/air, where A is a dielectric layer, B is a plasma layer, and N is the stack number. First, in the absence of an externally applied magnetic field, the structure can work as a multichannel filter whose channel number is equal to N - 1 for N > 1. Next, in the presence of an externally applied field, the filtering properties become tunable, i.e., the channel frequencies can be shifted as a function of the applied magnetic field. We find that the effect of the magnetic field will cause the channel frequencies to be blue-shifted or red-shifted depending on the orientation of the applied magnetic field.
AB - The microwave magnetic-field tunable filtering properties in a multichannel filter based on use of a one-dimensional finite magnetized plasma photonic crystal (PPC) are theoretically investigated. The considered PPC has a structure of air/(AB)N/air, where A is a dielectric layer, B is a plasma layer, and N is the stack number. First, in the absence of an externally applied magnetic field, the structure can work as a multichannel filter whose channel number is equal to N - 1 for N > 1. Next, in the presence of an externally applied field, the filtering properties become tunable, i.e., the channel frequencies can be shifted as a function of the applied magnetic field. We find that the effect of the magnetic field will cause the channel frequencies to be blue-shifted or red-shifted depending on the orientation of the applied magnetic field.
UR - http://www.scopus.com/inward/record.url?scp=84962061528&partnerID=8YFLogxK
U2 - 10.1364/AO.55.000943
DO - 10.1364/AO.55.000943
M3 - 文章
AN - SCOPUS:84962061528
SN - 1559-128X
VL - 55
SP - 943
EP - 946
JO - Applied Optics
JF - Applied Optics
IS - 4
ER -