Mechanical properties and oxidation behavior of ZrN_x thin films fabricated through high-power impulse magnetron sputtering deposition

ZrN_x thin films were deposited on silicon substrates using novel high-power impulse magnetron sputtering. The films were annealed at 600 °C in an atmosphere of 15 ppm O₂-N₂, and their performance as a protective hard coating on glass molding dies was evaluated. The as-deposited ZrN_x thin films were characterized by a high nanohardness of 26-27 GPa and low surface roughness of approximately 0.5 nm. However, the mechanical properties of the ZrN_x thin films declined after they were annealed owing to the formation of ZrO₂ scales.