Mechanical properties and oxidation behavior of ZrNx thin films fabricated through high-power impulse magnetron sputtering deposition

Li Chun Chang; Ching Yen Chang; Yung I. Chen; Hsuan Ling Kao

doi:10.1116/1.4941070

Mechanical properties and oxidation behavior of ZrN_x thin films fabricated through high-power impulse magnetron sputtering deposition

Li Chun Chang
, Ching Yen Chang
, Yung I. Chen
, Hsuan Ling Kao

Department of Electronic Engineering

Research output: Contribution to journal › Journal Article › peer-review

8 Scopus citations

Abstract

ZrN_x thin films were deposited on silicon substrates using novel high-power impulse magnetron sputtering. The films were annealed at 600 °C in an atmosphere of 15 ppm O₂-N₂, and their performance as a protective hard coating on glass molding dies was evaluated. The as-deposited ZrN_x thin films were characterized by a high nanohardness of 26-27 GPa and low surface roughness of approximately 0.5 nm. However, the mechanical properties of the ZrN_x thin films declined after they were annealed owing to the formation of ZrO₂ scales.

Original language	English
Article number	02D107
Journal	Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume	34
Issue number	2
DOIs	https://doi.org/10.1116/1.4941070
State	Published - 01 03 2016

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© 2016 American Vacuum Society.

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title = "Mechanical properties and oxidation behavior of ZrNx thin films fabricated through high-power impulse magnetron sputtering deposition",

abstract = "ZrNx thin films were deposited on silicon substrates using novel high-power impulse magnetron sputtering. The films were annealed at 600 °C in an atmosphere of 15 ppm O2-N2, and their performance as a protective hard coating on glass molding dies was evaluated. The as-deposited ZrNx thin films were characterized by a high nanohardness of 26-27 GPa and low surface roughness of approximately 0.5 nm. However, the mechanical properties of the ZrNx thin films declined after they were annealed owing to the formation of ZrO2 scales.",

author = "Chang, \{Li Chun\} and Chang, \{Ching Yen\} and Chen, \{Yung I.\} and Kao, \{Hsuan Ling\}",

note = "Publisher Copyright: {\textcopyright} 2016 American Vacuum Society.",

year = "2016",

month = mar,

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doi = "10.1116/1.4941070",

language = "英语",

volume = "34",

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Mechanical properties and oxidation behavior of ZrN_x thin films fabricated through high-power impulse magnetron sputtering deposition. / Chang, Li Chun; Chang, Ching Yen; Chen, Yung I. et al.
In: Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, Vol. 34, No. 2, 02D107, 01.03.2016.

Research output: Contribution to journal › Journal Article › peer-review

TY - JOUR

T1 - Mechanical properties and oxidation behavior of ZrNx thin films fabricated through high-power impulse magnetron sputtering deposition

AU - Chang, Li Chun

AU - Chang, Ching Yen

AU - Chen, Yung I.

AU - Kao, Hsuan Ling

PY - 2016/3/1

Y1 - 2016/3/1

N2 - ZrNx thin films were deposited on silicon substrates using novel high-power impulse magnetron sputtering. The films were annealed at 600 °C in an atmosphere of 15 ppm O2-N2, and their performance as a protective hard coating on glass molding dies was evaluated. The as-deposited ZrNx thin films were characterized by a high nanohardness of 26-27 GPa and low surface roughness of approximately 0.5 nm. However, the mechanical properties of the ZrNx thin films declined after they were annealed owing to the formation of ZrO2 scales.

AB - ZrNx thin films were deposited on silicon substrates using novel high-power impulse magnetron sputtering. The films were annealed at 600 °C in an atmosphere of 15 ppm O2-N2, and their performance as a protective hard coating on glass molding dies was evaluated. The as-deposited ZrNx thin films were characterized by a high nanohardness of 26-27 GPa and low surface roughness of approximately 0.5 nm. However, the mechanical properties of the ZrNx thin films declined after they were annealed owing to the formation of ZrO2 scales.

UR - https://www.scopus.com/pages/publications/84957073841

U2 - 10.1116/1.4941070

DO - 10.1116/1.4941070

M3 - 文章

AN - SCOPUS:84957073841

SN - 0734-2101

VL - 34

JO - Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

JF - Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

IS - 2

M1 - 02D107

ER -

Mechanical properties and oxidation behavior of ZrN_x thin films fabricated through high-power impulse magnetron sputtering deposition

Abstract

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