Microstructure analysis of a Cr-Ni multilayer pulse-electroplated in a bath containing trivalent chromium and divalent nickel ions

Ching An Huang; Chao Yu Chen; Chien Chun Chen; Thomas Kelly; Hung Ming Lin

doi:10.1016/j.surfcoat.2014.03.062

Microstructure analysis of a Cr-Ni multilayer pulse-electroplated in a bath containing trivalent chromium and divalent nickel ions

Ching An Huang^*, Chao Yu Chen, Chien Chun Chen, Thomas Kelly, Hung Ming Lin

^*Corresponding author for this work

Department of Mechanical Engineering

Research output: Contribution to journal › Journal Article › peer-review

9 Scopus citations

Abstract

A Cr-Ni multilayer comprised of alternating nanosized amorphous Cr- and crystalline Ni-rich sublayers was successfully prepared by pulse-current electroplating in a plating bath containing Cr³⁺ and Ni²⁺ ions. The microstructure of the Cr-Ni multilayer was analyzed with transmission electron microscopy, and the chemical composition was analyzed with Auger electron spectroscopy and a local electrode atom probe (LEAP). The analytical results of the LEAP showed small amounts of Cl, O and N in the Cr-rich layers but not in the Ni-rich ones. This indicates that the reduction of Cr³⁺ ions is complicated in the vicinity of the cathodic surface. Moreover, Cr tends to form chlorides and oxides during electrocrystallization. The electrocrystallization behavior of the Cr-Ni multilayer is discussed based on the results of the microstructure and chemical composition analyses.

Original language	English
Pages (from-to)	153-157
Number of pages	5
Journal	Surface and Coatings Technology
Volume	255
DOIs	https://doi.org/10.1016/j.surfcoat.2014.03.062
State	Published - 25 09 2014

Keywords

Cr-Ni multilayer
Electrocrystallization
Microstructure

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10.1016/j.surfcoat.2014.03.062

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title = "Microstructure analysis of a Cr-Ni multilayer pulse-electroplated in a bath containing trivalent chromium and divalent nickel ions",

abstract = "A Cr-Ni multilayer comprised of alternating nanosized amorphous Cr- and crystalline Ni-rich sublayers was successfully prepared by pulse-current electroplating in a plating bath containing Cr3+ and Ni2+ ions. The microstructure of the Cr-Ni multilayer was analyzed with transmission electron microscopy, and the chemical composition was analyzed with Auger electron spectroscopy and a local electrode atom probe (LEAP). The analytical results of the LEAP showed small amounts of Cl, O and N in the Cr-rich layers but not in the Ni-rich ones. This indicates that the reduction of Cr3+ ions is complicated in the vicinity of the cathodic surface. Moreover, Cr tends to form chlorides and oxides during electrocrystallization. The electrocrystallization behavior of the Cr-Ni multilayer is discussed based on the results of the microstructure and chemical composition analyses.",

keywords = "Cr-Ni multilayer, Electrocrystallization, Microstructure",

author = "Huang, \{Ching An\} and Chen, \{Chao Yu\} and Chen, \{Chien Chun\} and Thomas Kelly and Lin, \{Hung Ming\}",

year = "2014",

month = sep,

day = "25",

doi = "10.1016/j.surfcoat.2014.03.062",

language = "英语",

volume = "255",

pages = "153--157",

journal = "Surface and Coatings Technology",

issn = "0257-8972",

publisher = "Elsevier B.V.",

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TY - JOUR

T1 - Microstructure analysis of a Cr-Ni multilayer pulse-electroplated in a bath containing trivalent chromium and divalent nickel ions

AU - Huang, Ching An

AU - Chen, Chao Yu

AU - Chen, Chien Chun

AU - Kelly, Thomas

AU - Lin, Hung Ming

PY - 2014/9/25

Y1 - 2014/9/25

N2 - A Cr-Ni multilayer comprised of alternating nanosized amorphous Cr- and crystalline Ni-rich sublayers was successfully prepared by pulse-current electroplating in a plating bath containing Cr3+ and Ni2+ ions. The microstructure of the Cr-Ni multilayer was analyzed with transmission electron microscopy, and the chemical composition was analyzed with Auger electron spectroscopy and a local electrode atom probe (LEAP). The analytical results of the LEAP showed small amounts of Cl, O and N in the Cr-rich layers but not in the Ni-rich ones. This indicates that the reduction of Cr3+ ions is complicated in the vicinity of the cathodic surface. Moreover, Cr tends to form chlorides and oxides during electrocrystallization. The electrocrystallization behavior of the Cr-Ni multilayer is discussed based on the results of the microstructure and chemical composition analyses.

AB - A Cr-Ni multilayer comprised of alternating nanosized amorphous Cr- and crystalline Ni-rich sublayers was successfully prepared by pulse-current electroplating in a plating bath containing Cr3+ and Ni2+ ions. The microstructure of the Cr-Ni multilayer was analyzed with transmission electron microscopy, and the chemical composition was analyzed with Auger electron spectroscopy and a local electrode atom probe (LEAP). The analytical results of the LEAP showed small amounts of Cl, O and N in the Cr-rich layers but not in the Ni-rich ones. This indicates that the reduction of Cr3+ ions is complicated in the vicinity of the cathodic surface. Moreover, Cr tends to form chlorides and oxides during electrocrystallization. The electrocrystallization behavior of the Cr-Ni multilayer is discussed based on the results of the microstructure and chemical composition analyses.

KW - Cr-Ni multilayer

KW - Electrocrystallization

KW - Microstructure

UR - https://www.scopus.com/pages/publications/84906318363

U2 - 10.1016/j.surfcoat.2014.03.062

DO - 10.1016/j.surfcoat.2014.03.062

M3 - 文章

AN - SCOPUS:84906318363

SN - 0257-8972

VL - 255

SP - 153

EP - 157

JO - Surface and Coatings Technology

JF - Surface and Coatings Technology

ER -

Microstructure analysis of a Cr-Ni multilayer pulse-electroplated in a bath containing trivalent chromium and divalent nickel ions

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Keywords

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