Microstructure and mechanical properties of CrN films fabricated by high power pulsed magnetron discharge plasma immersion ion implantation and deposition

Zhongzhen Wu; Xiubo Tian; Zeming Wang; Chunzhi Gong; Shiqin Yang; Cher Ming Tan; Paul K. Chu

doi:10.1016/j.apsusc.2011.08.039

Microstructure and mechanical properties of CrN films fabricated by high power pulsed magnetron discharge plasma immersion ion implantation and deposition

Zhongzhen Wu
, Xiubo Tian^*
, Zeming Wang
, Chunzhi Gong
, Shiqin Yang
, Cher Ming Tan
, Paul K. Chu

^*Corresponding author for this work

Harbin Institute of Technology
Nanyang Technological University
City University of Hong Kong

Research output: Contribution to journal › Journal Article › peer-review

26 Scopus citations

Abstract

CrN films with strong adhesion with the substrate have been fabricated on Ti6Al4V alloy using novel plasma immersion ion implantation and deposition (PIII&D) based on high power pulsed magnetron sputtering (HPPMS). A macro-particle free chromium plasma is generated by HPPMS while the samples are subjected to high voltage pulses to conduct PIII&D. The CrN coatings have a dense columnar structure and low surface roughness. The grains in the films have the face-center cubic (fcc) structure with the (2 0 0) preferred orientation. An excellent adhesion is achieved with a critical load up to 74.7 N. An implantation voltage of 18 kV yields a hardness of 18 GPa and better wear resistance and a low friction coefficient of 0.48 are achieved.

Original language	English
Pages (from-to)	242-246
Number of pages	5
Journal	Applied Surface Science
Volume	258
Issue number	1
DOIs	https://doi.org/10.1016/j.apsusc.2011.08.039
State	Published - 15 10 2011
Externally published	Yes

Keywords

CrN
High power pulsed magnetron sputtering
High-voltage pulse
Plasma ion implantation and deposition

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10.1016/j.apsusc.2011.08.039

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@article{a6f173eae97f4e9c89080f7eb2b62c36,

title = "Microstructure and mechanical properties of CrN films fabricated by high power pulsed magnetron discharge plasma immersion ion implantation and deposition",

abstract = "CrN films with strong adhesion with the substrate have been fabricated on Ti6Al4V alloy using novel plasma immersion ion implantation and deposition (PIII\&D) based on high power pulsed magnetron sputtering (HPPMS). A macro-particle free chromium plasma is generated by HPPMS while the samples are subjected to high voltage pulses to conduct PIII\&D. The CrN coatings have a dense columnar structure and low surface roughness. The grains in the films have the face-center cubic (fcc) structure with the (2 0 0) preferred orientation. An excellent adhesion is achieved with a critical load up to 74.7 N. An implantation voltage of 18 kV yields a hardness of 18 GPa and better wear resistance and a low friction coefficient of 0.48 are achieved.",

keywords = "CrN, High power pulsed magnetron sputtering, High-voltage pulse, Plasma ion implantation and deposition",

author = "Zhongzhen Wu and Xiubo Tian and Zeming Wang and Chunzhi Gong and Shiqin Yang and Tan, \{Cher Ming\} and Chu, \{Paul K.\}",

year = "2011",

month = oct,

day = "15",

doi = "10.1016/j.apsusc.2011.08.039",

language = "英语",

volume = "258",

pages = "242--246",

journal = "Applied Surface Science",

issn = "0169-4332",

publisher = "Elsevier B.V.",

number = "1",

}

TY - JOUR

T1 - Microstructure and mechanical properties of CrN films fabricated by high power pulsed magnetron discharge plasma immersion ion implantation and deposition

AU - Wu, Zhongzhen

AU - Tian, Xiubo

AU - Wang, Zeming

AU - Gong, Chunzhi

AU - Yang, Shiqin

AU - Tan, Cher Ming

AU - Chu, Paul K.

PY - 2011/10/15

Y1 - 2011/10/15

N2 - CrN films with strong adhesion with the substrate have been fabricated on Ti6Al4V alloy using novel plasma immersion ion implantation and deposition (PIII&D) based on high power pulsed magnetron sputtering (HPPMS). A macro-particle free chromium plasma is generated by HPPMS while the samples are subjected to high voltage pulses to conduct PIII&D. The CrN coatings have a dense columnar structure and low surface roughness. The grains in the films have the face-center cubic (fcc) structure with the (2 0 0) preferred orientation. An excellent adhesion is achieved with a critical load up to 74.7 N. An implantation voltage of 18 kV yields a hardness of 18 GPa and better wear resistance and a low friction coefficient of 0.48 are achieved.

AB - CrN films with strong adhesion with the substrate have been fabricated on Ti6Al4V alloy using novel plasma immersion ion implantation and deposition (PIII&D) based on high power pulsed magnetron sputtering (HPPMS). A macro-particle free chromium plasma is generated by HPPMS while the samples are subjected to high voltage pulses to conduct PIII&D. The CrN coatings have a dense columnar structure and low surface roughness. The grains in the films have the face-center cubic (fcc) structure with the (2 0 0) preferred orientation. An excellent adhesion is achieved with a critical load up to 74.7 N. An implantation voltage of 18 kV yields a hardness of 18 GPa and better wear resistance and a low friction coefficient of 0.48 are achieved.

KW - CrN

KW - High power pulsed magnetron sputtering

KW - High-voltage pulse

KW - Plasma ion implantation and deposition

UR - https://www.scopus.com/pages/publications/80054768589

U2 - 10.1016/j.apsusc.2011.08.039

DO - 10.1016/j.apsusc.2011.08.039

M3 - 文章

AN - SCOPUS:80054768589

SN - 0169-4332

VL - 258

SP - 242

EP - 246

JO - Applied Surface Science

JF - Applied Surface Science

IS - 1

ER -

Microstructure and mechanical properties of CrN films fabricated by high power pulsed magnetron discharge plasma immersion ion implantation and deposition

Abstract

Keywords

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