Microwave performance of double δ-doped high electron mobility transistor with various lower/upper planar-doped ratio designs

Hsien Chin Chiu*, Chung Wen Chen, Yuan Chang Huang

*Corresponding author for this work

Research output: Contribution to journalJournal Article peer-review

2 Scopus citations

Abstract

The microwave noise, power, and linearity characteristics of pseudomorphic high electron mobility transistors (pHEMTs) with various lower/upper planar δ-doped ratios were systematically evaluated and studied. By varying the lower/upper δ-doped ratio from 1:1 to 1:4, both Schottky gate turn-on voltage VON and breakdown voltage VBR were reduced. In addition, higher upper δ-doped design is effective in improving the device current density, transconductance, output power, and power-added efficiency; however, this design also scarified the flatness of transconductance distribution and Schottky performance, resulting in a degradation of device linearity. As to the noise performance, after increasing the upper δ-doped concentration by more than 2 × 1012 cm-2, the minimum noise figure NFmin can be reduced to a stable range, and higher current density cannot efficiently improve the noise performance. Although the 1:4 design provided the largest power density of pHEMT, its high gate leakage current at high input power swing limited its linearity, and 1:3 design achieved the best linearity performance.

Original languageEnglish
Pages (from-to)256-260
Number of pages5
JournalIEEE Transactions on Electron Devices
Volume55
Issue number1
DOIs
StatePublished - 01 2008

Keywords

  • Linearity
  • Noise
  • Power
  • Pseudomorphic high electron mobility transistors (pHEMTs)
  • δ-doped

Fingerprint

Dive into the research topics of 'Microwave performance of double δ-doped high electron mobility transistor with various lower/upper planar-doped ratio designs'. Together they form a unique fingerprint.

Cite this