Modeling ferroelectric capacitors for memory applications

Xiao Hong Du*, Bing Sheu

*Corresponding author for this work

Research output: Contribution to journalJournal Article peer-review

9 Scopus citations

Abstract

The modeling of ferroelectric capacitors for memory applications is discussed. Ferroelectric random access memory (FRAM) is a nonvolatile memory that features fast read/write operations and low-power, battery-packed SRAM. The FRAM cell stores data in a capacitor that uses ferroelectric film as dielectric material. The modeling of ferroelectric capacitor is to efficiently record the history of the capacitor and to accurately determine the next value of the polarization form its history, the current state and the trend to the applied voltage.

Original languageEnglish
Pages (from-to)10-16
Number of pages7
JournalIEEE Circuits and Devices Magazine
Volume18
Issue number6
DOIs
StatePublished - 11 2002
Externally publishedYes

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