Nonvolatile memory characteristics of ALD RuO2 metal nanocrystals in the N-Si/SiO2/HFO2/RuO2/Al2O3/IROx capacitors.

A. Das, Siddheswar Maikap, Liann-Be Chang

Research output: Contribution to conference › Proceeding

Original language	American English
State	Published - 2008
Event	2008 International Electron Devices and Materials Symposia (IEDMS 2008) - Taichung,Taiwan Duration: 28 11 2008 → 29 11 2008

Conference	2008 International Electron Devices and Materials Symposia (IEDMS 2008)
Period	28/11/08 → 29/11/08

Cite this

@conference{d3990508b7544a5f85b8adf7a23c58d3,

title = "Nonvolatile memory characteristics of ALD RuO2 metal nanocrystals in the N-Si/SiO2/HFO2/RuO2/Al2O3/IROx capacitors.",

author = "A. Das and Siddheswar Maikap and Liann-Be Chang",

year = "2008",

language = "American English",

note = "2008 International Electron Devices and Materials Symposia (IEDMS 2008) ; Conference date: 28-11-2008 Through 29-11-2008",

}