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Optical recombination-emission characteristics and surface morphologies of InAs quantum dots grown on misoriented GaAs substrate by MOCVD

  • M. Y. Hsu
  • , S. F. Tang*
  • , C. D. Chiang
  • , C. C. Su
  • , L. C. Wang
  • , C. T. Kuo
  • *Corresponding author for this work
  • National Taipei University of Technology
  • Chung-shan Institute of Science and Technology Taiwan
  • National Yang Ming Chiao Tung University

Research output: Contribution to journal › Conference article › peer-review

2 Scopus citations

Abstract

The InAs quantum dot (QD) structures grown on (100) 2°, 6°, 10°, 15° off-angles to (111)A GaAs substrate have been investigated by atomic force microscopy (AFM) and cryogenic photoluminescence (PL). The exact-angle InAs/GaAs is used as the reference sample. The blue shift of PL peak spectra with increasing misoriented scales has also been observed experimentally. In this work, we demonstrated that different off-angle substrates would influence the distribution and uniformity of QD due to variant surface potential energies, which are responsible for the two-stage process (migration and nucleation) of InAs adatoms on the off-angle substrates.

Original languageEnglish
Pages (from-to)183-187
Number of pages5
JournalThin Solid Films
Volume498
Issue number1-2
DOIs
StatePublished - 01 03 2006
Externally publishedYes
EventProceedings of the Third Asian Conference on Chemical Vapor Deposition (Third Asian-CVD), Third Asian CVD -
Duration: 12 11 2004 → 14 11 2004

Keywords

  • AFM
  • Metal-organic chemical vapour deposition (MOCVD)
  • PL
  • Quantum dot infrared photodetector (QDIP)

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