Optimization of growth parameters for improved adhesion and electricity of molybdenum films deposited by RF magnetron sputtering

Shou Yi Kuo*, Ming Jer Jeng, Liann Be Chang, Wei Ting Lin, Sung Cheng Hu, Yung Tien Lu, Ching Wen Wu

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

4 Scopus citations

Abstract

In this article, we report the fabrication and characterization of molybdenum (Mo) thin films on soda-lime glass substrate grown by reactive RF magnetron sputtering for Cu(ln,Ga)Se 2 thin film solar cells. It was found that the growth parameters, such as argon flow rate, RF power, bi-Iayer of Mo thin films and substrate temperature, have significant influences on properties of Mo films. As the argon flow rate was increased, the sheet resistance of Mo films increase, and the strain were changed from tensile to compressive. Higher RF power leads to a decrease on sheet resistance, and the optimal thickness and sheet resistance are 1 μm and 0.2 Ωl□. In addition, our experimental results proved that the increase of substrate temperature will lead to better adhesion of Mo thin film with glass substrate, and lower sheet resistance (0.11-0.14 Ω/□).

Original languageEnglish
Title of host publication2009 34th IEEE Photovoltaic Specialists Conference, PVSC 2009
Pages594-596
Number of pages3
DOIs
StatePublished - 2009
Event2009 34th IEEE Photovoltaic Specialists Conference, PVSC 2009 - Philadelphia, PA, United States
Duration: 07 06 200912 06 2009

Publication series

NameConference Record of the IEEE Photovoltaic Specialists Conference
ISSN (Print)0160-8371

Conference

Conference2009 34th IEEE Photovoltaic Specialists Conference, PVSC 2009
Country/TerritoryUnited States
CityPhiladelphia, PA
Period07/06/0912/06/09

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