Performance enhancement for strained HfCO2 nMOSFET with Contact Etch Stop Layer (CESL) under pulsed-IV measurement

  • Woei Cherng Wu*
  • , Tien Sheng Chao
  • , Te Hsin Chiu
  • , Jer Chyi Wang
  • , Chao Sung Lai
  • , Ma Ming-Wen
  • , Wen Cheng Lo
  • , Yi Hsun Ho
    • *Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

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