Photocatalytic TiO2 films deposited by rf magnetron sputtering at different oxygen partial pressure

W. S. Lin; C. H. Huang; W. J. Yang; C. Y. Hsu; K. H. Hou

doi:10.1016/j.cap.2010.05.014

Photocatalytic TiO₂ films deposited by rf magnetron sputtering at different oxygen partial pressure

W. S. Lin
, C. H. Huang
, W. J. Yang
, C. Y. Hsu
, K. H. Hou

Department of Mechanical Engineering

Chang Gung University
Lunghwa University of Science and Technology

Research output: Contribution to journal › Journal Article › peer-review

19 Scopus citations

Abstract

Titanium dioxide (TiO₂) films were deposited onto non-alkali glass substrates by r.f. magnetron sputtering at an [O₂/(Ar + O ₂)] flow-rate of 0, 20, 40, 60 and 70%, respectively. The sputtering pressure was 10 mtorr, substrate temperature was around 450 °C after 3 h deposition. The crystalline structure, surface morphology and photocatalytic activity of the TiO₂ films were affected by various [O ₂/(O₂ + Ar)] flow-rate ratios. The films were characterized by X-ray diffraction (XRD), atomic force microscopy (AFM), scanning electron microscopy (SEM) and UV-vis-NIR spectroscopy. X-ray diffraction spectra showed that all the films display anatase (1 0 1) preferred orientation. Photoinduced decomposition of methylene blue (MB) and photoinduced hydrophilicity were enhanced when the [O₂/(Ar + O₂)] flow-rate increased to 60%.

Original language	English
Pages (from-to)	1461-1466
Number of pages	6
Journal	Current Applied Physics
Volume	10
Issue number	6
DOIs	https://doi.org/10.1016/j.cap.2010.05.014
State	Published - 11 2010

Keywords

Methylene blue
Photocatalytic activity
Titanium dioxide
[O/(Ar+O)] flow-rate ratios

Access to Document

10.1016/j.cap.2010.05.014

Cite this

@article{ce9554c95cbd451e9d9f285261c2c7d1,

title = "Photocatalytic TiO2 films deposited by rf magnetron sputtering at different oxygen partial pressure",

abstract = "Titanium dioxide (TiO2) films were deposited onto non-alkali glass substrates by r.f. magnetron sputtering at an [O2/(Ar + O 2)] flow-rate of 0, 20, 40, 60 and 70\%, respectively. The sputtering pressure was 10 mtorr, substrate temperature was around 450 °C after 3 h deposition. The crystalline structure, surface morphology and photocatalytic activity of the TiO2 films were affected by various [O 2/(O2 + Ar)] flow-rate ratios. The films were characterized by X-ray diffraction (XRD), atomic force microscopy (AFM), scanning electron microscopy (SEM) and UV-vis-NIR spectroscopy. X-ray diffraction spectra showed that all the films display anatase (1 0 1) preferred orientation. Photoinduced decomposition of methylene blue (MB) and photoinduced hydrophilicity were enhanced when the [O2/(Ar + O2)] flow-rate increased to 60\%.",

keywords = "Methylene blue, Photocatalytic activity, Titanium dioxide, [O/(Ar+O)] flow-rate ratios",

author = "Lin, \{W. S.\} and Huang, \{C. H.\} and Yang, \{W. J.\} and Hsu, \{C. Y.\} and Hou, \{K. H.\}",

year = "2010",

month = nov,

doi = "10.1016/j.cap.2010.05.014",

language = "英语",

volume = "10",

pages = "1461--1466",

journal = "Current Applied Physics",

issn = "1567-1739",

publisher = "Elsevier B.V.",

number = "6",

}

TY - JOUR

T1 - Photocatalytic TiO2 films deposited by rf magnetron sputtering at different oxygen partial pressure

AU - Lin, W. S.

AU - Huang, C. H.

AU - Yang, W. J.

AU - Hsu, C. Y.

AU - Hou, K. H.

PY - 2010/11

Y1 - 2010/11

N2 - Titanium dioxide (TiO2) films were deposited onto non-alkali glass substrates by r.f. magnetron sputtering at an [O2/(Ar + O 2)] flow-rate of 0, 20, 40, 60 and 70%, respectively. The sputtering pressure was 10 mtorr, substrate temperature was around 450 °C after 3 h deposition. The crystalline structure, surface morphology and photocatalytic activity of the TiO2 films were affected by various [O 2/(O2 + Ar)] flow-rate ratios. The films were characterized by X-ray diffraction (XRD), atomic force microscopy (AFM), scanning electron microscopy (SEM) and UV-vis-NIR spectroscopy. X-ray diffraction spectra showed that all the films display anatase (1 0 1) preferred orientation. Photoinduced decomposition of methylene blue (MB) and photoinduced hydrophilicity were enhanced when the [O2/(Ar + O2)] flow-rate increased to 60%.

AB - Titanium dioxide (TiO2) films were deposited onto non-alkali glass substrates by r.f. magnetron sputtering at an [O2/(Ar + O 2)] flow-rate of 0, 20, 40, 60 and 70%, respectively. The sputtering pressure was 10 mtorr, substrate temperature was around 450 °C after 3 h deposition. The crystalline structure, surface morphology and photocatalytic activity of the TiO2 films were affected by various [O 2/(O2 + Ar)] flow-rate ratios. The films were characterized by X-ray diffraction (XRD), atomic force microscopy (AFM), scanning electron microscopy (SEM) and UV-vis-NIR spectroscopy. X-ray diffraction spectra showed that all the films display anatase (1 0 1) preferred orientation. Photoinduced decomposition of methylene blue (MB) and photoinduced hydrophilicity were enhanced when the [O2/(Ar + O2)] flow-rate increased to 60%.

KW - Methylene blue

KW - Photocatalytic activity

KW - Titanium dioxide

KW - [O/(Ar+O)] flow-rate ratios

UR - https://www.scopus.com/pages/publications/77955552798

U2 - 10.1016/j.cap.2010.05.014

DO - 10.1016/j.cap.2010.05.014

M3 - 文章

AN - SCOPUS:77955552798

SN - 1567-1739

VL - 10

SP - 1461

EP - 1466

JO - Current Applied Physics

JF - Current Applied Physics

IS - 6

ER -

Photocatalytic TiO₂ films deposited by rf magnetron sputtering at different oxygen partial pressure

Abstract

Keywords

Access to Document

Other files and links

Fingerprint

Cite this