Photochemistry of monolayer CH3i on Ag-covered TiO 2(110) surface

Chaochin Su; Chih Chieng Chen; Chih Song Tsai; Jong Liang Lin; Jiing Chyuan Lin

doi:10.1143/JJAP.45.7845

Photochemistry of monolayer CH₃i on Ag-covered TiO ₂(110) surface

Chaochin Su^*, Chih Chieng Chen, Chih Song Tsai, Jong Liang Lin, Jiing Chyuan Lin

^*Corresponding author for this work

Research output: Contribution to journal › Journal Article › peer-review

1 Scopus citations

Abstract

The photochemistry of monolayer methyl iodide (CH₃I) on a silver-covered TiO₂(110) surface is studied by X-ray photoelectron spectroscopy (XPS). Upon the UV irradiation of CH₃I/Ag/TiO ₂(110) at a cryogenic temperature, methyl iodide undergoes desorption and dissociation. The cross sections for CH3I dissociation and desorption are measured at different photon wavelengths of 251, 290, 312, 364, 403, and 546nm. The photochemistry of monolayer CH₃I on Ag/TiO₂(110) is wavelength dependent. While photodissociation is the predominant mechanism for CH₃I depletion upon irradiation with large-wavelength lights, the nonthermal photodesorption of molecular CH₃I becomes the major process at wavelengths below 312 nm. The desorption of energetic CH₃ fragments following CH₃I photodissociation is evident. Possible mechanisms for the present photochemistry of CH₃I on Ag/TiO ₂(110) are discussed and compared with those on the Ag(111) and TiO₂(110) surfaces.

Original language	English
Pages (from-to)	7845-7853
Number of pages	9
Journal	Japanese Journal of Applied Physics
Volume	45
Issue number	10 A
DOIs	https://doi.org/10.1143/JJAP.45.7845
State	Published - 15 10 2006
Externally published	Yes

Keywords

Adsorption
CHI
Mechanism
Photochemistry
Titanium dioxide

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title = "Photochemistry of monolayer CH3i on Ag-covered TiO 2(110) surface",

abstract = "The photochemistry of monolayer methyl iodide (CH3I) on a silver-covered TiO2(110) surface is studied by X-ray photoelectron spectroscopy (XPS). Upon the UV irradiation of CH3I/Ag/TiO 2(110) at a cryogenic temperature, methyl iodide undergoes desorption and dissociation. The cross sections for CH3I dissociation and desorption are measured at different photon wavelengths of 251, 290, 312, 364, 403, and 546nm. The photochemistry of monolayer CH3I on Ag/TiO2(110) is wavelength dependent. While photodissociation is the predominant mechanism for CH3I depletion upon irradiation with large-wavelength lights, the nonthermal photodesorption of molecular CH3I becomes the major process at wavelengths below 312 nm. The desorption of energetic CH3 fragments following CH3I photodissociation is evident. Possible mechanisms for the present photochemistry of CH3I on Ag/TiO 2(110) are discussed and compared with those on the Ag(111) and TiO2(110) surfaces.",

keywords = "Adsorption, CHI, Mechanism, Photochemistry, Titanium dioxide",

author = "Chaochin Su and Chen, {Chih Chieng} and Tsai, {Chih Song} and Lin, {Jong Liang} and Lin, {Jiing Chyuan}",

year = "2006",

month = oct,

day = "15",

doi = "10.1143/JJAP.45.7845",

language = "英语",

volume = "45",

pages = "7845--7853",

journal = "Japanese Journal of Applied Physics",

issn = "0021-4922",

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TY - JOUR

T1 - Photochemistry of monolayer CH3i on Ag-covered TiO 2(110) surface

AU - Su, Chaochin

AU - Chen, Chih Chieng

AU - Tsai, Chih Song

AU - Lin, Jong Liang

AU - Lin, Jiing Chyuan

PY - 2006/10/15

Y1 - 2006/10/15

N2 - The photochemistry of monolayer methyl iodide (CH3I) on a silver-covered TiO2(110) surface is studied by X-ray photoelectron spectroscopy (XPS). Upon the UV irradiation of CH3I/Ag/TiO 2(110) at a cryogenic temperature, methyl iodide undergoes desorption and dissociation. The cross sections for CH3I dissociation and desorption are measured at different photon wavelengths of 251, 290, 312, 364, 403, and 546nm. The photochemistry of monolayer CH3I on Ag/TiO2(110) is wavelength dependent. While photodissociation is the predominant mechanism for CH3I depletion upon irradiation with large-wavelength lights, the nonthermal photodesorption of molecular CH3I becomes the major process at wavelengths below 312 nm. The desorption of energetic CH3 fragments following CH3I photodissociation is evident. Possible mechanisms for the present photochemistry of CH3I on Ag/TiO 2(110) are discussed and compared with those on the Ag(111) and TiO2(110) surfaces.

AB - The photochemistry of monolayer methyl iodide (CH3I) on a silver-covered TiO2(110) surface is studied by X-ray photoelectron spectroscopy (XPS). Upon the UV irradiation of CH3I/Ag/TiO 2(110) at a cryogenic temperature, methyl iodide undergoes desorption and dissociation. The cross sections for CH3I dissociation and desorption are measured at different photon wavelengths of 251, 290, 312, 364, 403, and 546nm. The photochemistry of monolayer CH3I on Ag/TiO2(110) is wavelength dependent. While photodissociation is the predominant mechanism for CH3I depletion upon irradiation with large-wavelength lights, the nonthermal photodesorption of molecular CH3I becomes the major process at wavelengths below 312 nm. The desorption of energetic CH3 fragments following CH3I photodissociation is evident. Possible mechanisms for the present photochemistry of CH3I on Ag/TiO 2(110) are discussed and compared with those on the Ag(111) and TiO2(110) surfaces.

KW - Adsorption

KW - CHI

KW - Mechanism

KW - Photochemistry

KW - Titanium dioxide

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U2 - 10.1143/JJAP.45.7845

DO - 10.1143/JJAP.45.7845

M3 - 文章

AN - SCOPUS:34547891895

SN - 0021-4922

VL - 45

SP - 7845

EP - 7853

JO - Japanese Journal of Applied Physics

JF - Japanese Journal of Applied Physics

IS - 10 A

ER -

Photochemistry of monolayer CH₃i on Ag-covered TiO ₂(110) surface

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