Physical and electrical characteristics of atomic layer deposited TiN nanocrystal memory capacitors

S. Maikap*, P. J. Tzeng, H. Y. Lee, C. C. Wang, T. C. Tien, L. S. Lee, M. J. Tsai

*Corresponding author for this work

Research output: Contribution to journalJournal Article peer-review

37 Scopus citations

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