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Physical and electrical characteristics of the high-k Nd2O3 polyoxide deposited on polycrystalline silicon
Chyuan Haur Kao*, T. C. Chan, Kung Shao Chen, Yu Teng Chung, Wen Shih Luo
*Corresponding author for this work
Research output: Contribution to journal › Journal Article › peer-review
13
Scopus
citations