Physical and electrical characteristics of the high-k Ta2 O 5 (tantalum pentoxide) dielectric deposited on the polycrystalline silicon

Chyuan Haur Kao*, Hsiang Chen, Jing Sing Chiu, Kung Shao Chen, Yu Tsung Pan

*Corresponding author for this work

Research output: Contribution to journal › Journal Article › peer-review

31 Scopus citations

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