Process Optimization of Dual-sputtered HfGdO Charge Trapping Layer in SONOS-Type Nonvolatile Memory

Pai-Chi Chou, Jer-Chyi Wang, Chao-Sung Lai, Li-Chi Liu

Research output: Contribution to conference › Proceeding

Original language	American English
State	Published - 2009
Event	2009 International Electron Devices and Materials Symposia - Taoyuan, Taiwan Duration: 19 11 2009 → 20 11 2009

Conference	2009 International Electron Devices and Materials Symposia
Period	19/11/09 → 20/11/09

Cite this

@conference{ea07557f499f490ca12b48f067292e5f,

title = "Process Optimization of Dual-sputtered HfGdO Charge Trapping Layer in SONOS-Type Nonvolatile Memory",

author = "Pai-Chi Chou and Jer-Chyi Wang and Chao-Sung Lai and Li-Chi Liu",

year = "2009",

language = "American English",

note = "2009 International Electron Devices and Materials Symposia ; Conference date: 19-11-2009 Through 20-11-2009",

}